Yearly Archives: 2018
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2018
Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster.
8 years ago
SPICE Model Generation by Machine Learning
by Thomas Blaesi
It was 1988 when I got into SPICE (Simulation Program with Integrated Circuit Emphasis) while I was characterizing a 1.5 μm Standard cell library developed by
8 years ago
Improving Memory on the Edge Using Octal Serial Flash Cache
Improving Memory on the Edge Using Octal Serial Flash Cache This webinar will discuss the various solutions for storing and executing microprocessor code on a typical IoT system. Reducing power
8 years ago
Bandstructure Effects in Nano Devices
Bandstructure Effects in Nano Devices&Examples Using NEMO5 As semiconductor device and circuit engineers we traditionally think of band edges and effective masses as fixed fundamental material parameters. However, at nanometer
8 years ago
SPICE Modeling for Flexible Electronics
SPICE Modeling for Flexible Electronics Flexible electronics has an exciting potential for enabling bendable, rollable and foldable displays, smart product labeling as well as various applications in wearable, healthcare and
8 years ago
MIPI I3C
MIPI I3C LEARN ABOUT MIPI I3C ALLIANCE STANDARD This webinar will provide a discussion of a new a standard from the MIPI Alliance – I3C. It unifies and extends the
8 years ago
Process Variation, Alignment and BEOL Effects on Circuit Level Performance
As process nodes continue to shrink, the requirement for additional physics is gradually creeping into each stage of the design process. By way of illustration, TCAD simulations are becoming more
8 years ago
Touch Panel Capacitance Extraction in Hipex Full Chip Extraction Tool Using Stellar Field Solver
The previously standalone Stellar GUI based field solver tool for parasitic extraction is now integrated into Hipex (Silvaco’s full chip extraction tool) in Expert GUI. In Hipex, user can choose
8 years ago
Dynamic Analysis of Liquid Crystal Pixels
We have demonstrated in previous articles the static electrical and optical simulation of LC cells [1][2]. The last piece of the function for a comprehensive analysis of an LC pixel
8 years ago
Hints, Tips and Solutions – Adding An Impurity to a Diffusion Model and Enable Diffusion of a New Impurity in a Specific Material
OBJECTIVE Add an impurity (H) to a material (silicon) for a diffusion model (Fermi). The description below refers to Victory Process version 7.27.X.
8 years ago
Memory Statistical Characterization Solution with VarMan
Memory Statistical Characterization Solution with VarMan With each new semiconductor process node, process variation, both global and local, play an increasingly significant role in determining Memory performance. When combined with