Computational lithography and Process Proximity Compensation

Lithography simulation, proximity correction and model calibration, fitted to your measured wafers. The mask you release prints the pattern you drew, and the first wafer run confirms it.

What is computational lithography?

Computational lithography is the software that predicts how a mask pattern will print on a wafer and changes the
mask so the printed result matches the design. Process proximity Compensation is its core step. It models how
exposure, resist and etch distort each feature, shifts mask edges to offset that distortion, then checks the
corrected mask in simulation.

The problem

The wafer doesn’t print what you drew. Below the exposure wavelength, diffraction, resist and etch each drag an edge off target. Lines thin. Corners round. Line ends pull back. A perfect layout can still produce the wrong silicon.

What the software does

It predicts that drift with a model calibrated on your silicon, corrects the layout, and simulates the result back before any data reaches the mask shop.

When you use it

When you qualify a new node and need to know whether a layer can print at all. At tape-out, on every critical layer. And in a yield ramp, when one layer keeps missing its critical dimension and nobody can say why yet.

Process Proximity Compensation (PPC)

Silvaco added Process Proximity Compensation from Cadence in March 2025.
DimensionPPC handles curvilinear masks.

Process Proximity Compensation (PPC)

Builds and verifies the mask your layout needs.

DimensionPPC

Curvilinear correction for layers that rectilinear masks can't print cleanly.

Where holding the pattern gets hard

Same physics everywhere. What changes is which distortion eats your error budget.

Error budgets in nanometers

Dense arrays, mask rules bind first

Thick layers, etch-dominated edges

Uniformity across the panel

MEMS and sensors

Deep etches, extreme aspect ratios

Line width and via landing

Compound semiconductors

Resist on non-silicon substrates

Sidewall roughness costs light

Foundries, nodes, formats and platforms

What it runs on, and what it runs against. Where nothing is published, this says so.

Foundries and nodes

PPC runs in production from large geometries to the most advanced processes. The PDK table covers Silvaco’s analog and custom IC tools; ask us directly about lithography coverage.

Operating systems and compute

Synthesis and verification are pipelined across general-purpose hardware, so a full-layer job spreads over your cluster.

Named customer work

DRAM

Curvilinear OPC

Micron

Presented curvilinear OPC on DimensionPPC for DRAM layers, covering mask synthesis, simulation-based verification and mask rule checks.

Nobue Kosa, Member of Technical Staff, Advanced Mask Development, Recipe and Tool Development, Micron

Lithography and TCAD process simulation

Lithography settles which shapes reach the wafer. TCAD process simulation picks them up from there, through etch, deposition and implant, and into a working device.

Lithography papers and sessions

Read any of it without filling in a form.

Conference session

2026

Curvilinear OPC Applications

Micron's curvilinear OPC work on DRAM layers, using DimensionPPC.

Licensing and support for lithography tools

The questions that come before a purchase order. Where the published answer
covers the other product families but not this one, that is said rather than glossed.

Licensing options

Time-Based Licensing: floating seats on terms of one to three years, with updates and technical support in the fee.

Installation and OS support

Licenses run from a server on your network; the installation guide covers setup.

Documentation

User manuals, reference guides and release notes for PPC and DimensionPPC.

Support portal

File a case and follow its status in the portal; access needs a current maintenance contract.

Talk to our technical experts
about one layer

Bring the layer, its node and whatever metrology you have.
An application engineer will scope the calibration with you.

Lithography questions

What is process proximity compensation?

Process proximity compensation (PPC) makes a printed feature match its drawing. Exposure, resist and etch each move a feature's edges, so a line never prints exactly as drawn. PPC predicts that movement and pre-distorts the mask by the opposite amount.

Optical proximity correction (OPC) corrects for what the optics do during exposure. PPC also accounts for resist, etch and mask effects, which shift the final dimension too. Silvaco's Process Proximity Compensation is an OPC suite whose process model covers that wider set, so it corrects toward the dimension you'll measure.

Computational lithography makes sub-wavelength features print correctly, which at an advanced node means every critical layer. Teams rely on it while qualifying a node, while preparing mask data for tape-out, and when a yield ramp stalls on a layer that won't hold its dimension.

Against your own measurements. You print test patterns, measure them with CD-SEM or other metrology, and adjust the model until its simulation reproduces the wafer. Silvaco's predictive process model fits resist, etch and mask behavior this way, so it describes your process, not a generic one.

They sit on either side of the same wafer. Lithography sets the printed pattern; Silvaco TCAD, including Victory Process, models what the fab does to it next. Both belong to Silvaco's AI-Driven Manufacturing unit alongside FTCO, solution platform

Silvaco's PDK table lists support for its analog and custom IC tools. Lithography sits outside it, so for a mask flow the useful question is whether your layer type has been corrected before. Ask us that.

Published so far: PPC distributes synthesis and verification across general-purpose hardware. Share your cluster size and layer count and we'll size a run for you.

Silvaco's University Program licenses its tools to more than 200 universities for research and teaching, separately from commercial sales. Contact the program with your group's project to check.