6 years ago
The qualification of GaN power high-electron-mobilitytransistors (HEMTs) must consider the device ruggedness against out-of-SOA (safe operating area) events [1- 3].
6 years ago
Dry etching is commonly used in semiconductor processing to generate deep trenches with good anisotropy. Dry etching is applied to many semiconductor technologies including Advanced FinFETs, 3D NAND, and vertical
6 years ago
September 17, 2020 | 13:00 – 13:30 (JST) The accuracy of rule-based full-chip parasitic capacitance extraction tools including Silvaco's Hipex is highly dependent on the description of the rule files.
6 years ago
2020년 10월 14일 | 2:00am-2:30am (한국 시각) 계산량이 지속적으로 증가하고, 메모리 시스템이 점점 높은 주파수에서 동작함에 따라, 고밀도, 저전력으로 면적을 적게 차지하는 고성능 메모리 서브 시스템에 대한 수요가 계속해서 증가하고
6 years ago
Silvaco technologists and research partners will be participating in the ESSDERC/ESSCIRC 2020 joint conference for solid-state devices and circuits. Tutorial #8, Ab-initio simulations supporting new materials & process developments, chaired
6 years ago
2020 TCAD Baseline Release Section 1: Process Simulation – New Features in 2020 Baseline Release
6 years ago
2020 TCAD Baseline Release Section 2: Meshing – New Features in 2020 Baseline Release
6 years ago
2020 TCAD Baseline Release Section 3: Device Simulation – New Features in 2020 Baseline Release
6 years ago
2020년 8월 28일 | 2:00am-2:30am (한국 시각) 최신 SoC의 고속 인터페이스 설계 개발과 관련된 당면 과제 및 솔루션에 대한 프레젠테이션을 제공합니다.
6 years ago
by Babak Taheri, Silvaco CEO
In 1966 Robert F. Kennedy delivered a speech that mentioned a curse, “May you live in interesting times.” Like it or not, we live in