2024

• 第一部分：Victory Process——2024基准版本中的新功能
• 第二部分：Victory Device——2024基准版本中的新功能
• 第三部分：Victory DoE——2024基准版本中的新功能

It is often the case that a design of experiments (DOE) is required to optimize the performance of a particular device. Sometimes this simply means tweaking the implant dose for

Recently a new diffusion model was introduced to Victory Process: the CMOS model. This model aims at taking on the challenges brought by the specificities of CMOS device processing such

Properly setting the wafer orientation in Victory Process (VP) is critical for various processes such as ion implantation, etching, and deposition. For ion implantation in particular, the determination of the