Victory Process 2D – An Innovative Alternative to SUPREM-based Simulators Ensuring Robust 3D Solutions
Two-dimensional process simulators based on SUPREM-IV from Stanford University have been used in semiconductor research and industry for almost 30 years. Tremendous progress in the semiconductor technology requires transition to a new generation of TCAD tools. Victory Process simulator meets most of current and future industry requirements because it provides robust 1D/2D/3D process simulation solutions and allows new materials and processes to be seamlessly introduced into a process flow.
Victory Process uses many innovative techniques including data structures, grids and solvers. It has multiple advantages over legacy process simulators. At the same time Victory Process facilitates smooth transition from “old” simulators and relatively easy learning curve for the users. This webinar will show how to use the two-dimensional version of Victory Process (VP2D) either instead Athena or as transition to full 3D simulation.
What attendees will learn:
- Key differences between Athena and Victory Process
- How to translate legacy SUPREM-based decks to VP2D using DeckBuild utility A2VP
- How to set, control and refine/unrefine simulation mesh
- How to use layout driven process simulation
- How to use basic geometrical and physical etching and deposition models
- How to export 2D structures for visualization and device simulation
Dr. Misha Temkin is a Senior Applications Engineer at Sil vaco TCAD Division in Santa Clara, California. He started his carrier 40 years ago in former USSR where he co-authored 2 books and 20 papers on Ion Implantation theory and simulation. After joining Silvaco in 1989 he lead development and support of Athena process simulator. In last 5 years he has focused on transition from Athena to Victory Process.
When: December 8, 2016
WHO SHOULD ATTEND:
Process and device engineers and researchers, current and prospective users of TCAD software.