Yearly Archives: 2024
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2024
Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster.
2 years ago
2024 TCAD基准版本软件发布
- 第一部分：Victory Process——2024基准版本中的新功能
- 第二部分：Victory Device——2024基准版本中的新功能
- 第三部分：Victory DoE——2024基准版本中的新功能
2 years ago
将人工智能应用于FTCOTM
2024年7月25日 FTCO基于实际生产工艺中的物理和化学机制，利用人工智能（AI）和机器学习（ML）生成精确的TCAD数字模型（数字孪生）。对于这种数字孪生模型，可以采用DoE方法进行测试和分析，而无需真实流片，从而大大节省了制造相关的时间和费用。
2 years ago
How Can I Re-Use Individual Monte-Carlo 3D Implant Profiles?
It is often the case that a design of experiments (DOE) is required to optimize the performance of a particular device. Sometimes this simply means tweaking the implant dose for
2 years ago
Comparison of Models for Fluorine Effect on Dopant Diffusion in CMOS Processes
Recently a new diffusion model was introduced to Victory Process: the CMOS model. This model aims at taking on the challenges brought by the specificities of CMOS device processing such