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2019

Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster.

7 years ago

Machine Learning in Silvaco EDA Software

In the following video, Dr. Firas Mohamed, VP & GM, Machine Learning & Flow Optimization Division and GM, Silvaco France talks with Graham Bell about Machine Learning technologies deployed in

7 years ago

パイオニア・マイクロ・テクノロジー、6インチSi Foundry CMOSプロセス向けにシルバコPDKの提供開始

株式会社シルバコ・ジャパン(以下、シルバコ)は、パイオニア・マイクロ・テクノロジー 株式会社(以下パイオニア・マイクロ・テクノロジー)が、自社のSi Foundryプロセス向けに0.35umCMOSプロセス用シルバコPDKの提供を開始したことを発表しました。

7 years ago

Silvaco SIPware Automotive IP

本ウェビナーでは、車載に関連する規格やシルバコSIPwareカタログから車載コントローラIPの具体的な機能を確認するとともに、車載セグメントと傾向について考察します。

7 years ago

I/O Design and Characterization – How Can You Compete with Free?

I interviewed Silvaco partner Stephen Fairbanks, CTO of Certus Semiconductor from the show floor at DAC 2019, in Las Vegas, about I/O Design and Characterization. He talks about using the

7 years ago

TCAD Simulation of Electric Field Distribution in Gallium Nitride Trench-based Power Devices

Introduction Gallium nitride (GaN)-based devices are excellent candidates for high-voltage and high-power applications, due to the superior physical properties of GaN compared to Si, SiC, and GaAs. Recently, GaN vertical

7 years ago

Channel-length Dependence of a-IGZO TFTs with Self-heating Effects

Introduction Amorphous In-Ga-Zn-O thin-film transistors (a-IGZO TFTs) show a high mobility, a small sub-threshold swing, and a low OFF-current, and they are considered to be one of the most promising

7 years ago

Simulation of Different Tunnel Junctions in InGaP/GaAs, InGaP/CdTe Dual Junction Solar Cells

Abstract — Dual junction solar cells were simulated using Silvaco TCAD tool with various tunnel junction material compositions. InGaP/GaAs dual junction solar cells were simulated with 10 different tunnel junction

7 years ago

Talking Atoms to Systems in Next-Generation SoC Designs

New system-on-chip (SoC) devices are driving new memory architectures and photonic interfaces, while specialized new intellectual property (IP) requires analysis down to the nanometer and atomic levels because of single

7 years ago

Hints, Tips and Solutions – July, August, September 2019

Q. Is it possible to emulate a deep reactive ion etch process (e.g. deep trench with scalloped sidewalls) without using a physical based process simulation, such as Victory Process? To

Verilog-Aを使用したロバストなSPICEモデリング: 原則と実践テクニック

本ウェビナーは、Verilog-Aを使用したSPICEコンパクトモデルのロバストなコーディングについて、専門的なガイダンスを行うことを目的とします。