AI-Driven Manufacturing covers the process and device physics. AI-Driven Design covers the EDA tools, IP, verification and enablement.
Multiphysics from simulation to the fab floor
EDA tools, licensed IP, verification and enablement
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Process and device physics, from simulation to the fab floor
低信号电气噪声不可避免,其成因在于器件内部过程的随机波动,例如热波动导致的载流子密度微观变化,以及产生-复合速率的统计波动。 此类噪声可能干扰电路预期行为,因此建模器件产生的噪声至关重要。了解噪声在器件中的具体产生位置亦具有重要意义,这有助于设计低噪声器件。Victory Device采用阻抗场法进行噪声计算。
GaN and SiC Power Semiconductor Markets Exceed $1B in 2021
1200 V垂直型氮化镓FinFET晶体管的TCAD击穿仿真
利用FTCO™和数字孪生技术加速面向制造的硅光集成电路仿真
Silvaco at DAC 2026
Silvaco Announces Immediate Availability of Mixel MIPI C-PHY/D-PHY Combo IP on TSMC N2P Process
面向 GAA-NS-FET 全器件尺寸设计探索与优化的快速集成量子输运解决方案
Silvaco Reports First Quarter 2026 Financial Results
利用AI驱动的FTCO加速下一代功率技术发展