Casey Molver

Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster. 

15 years ago

VICTORY Process is a 3D process simulation tool which allows for an accurate simulation of the doping distributions in semiconductor devices. It is able to simulate both the insertion of

16 years ago

The photovoltaic industry has rapidly grown since 2000 and has diversified in technology how the solar cell are manufactured. As of 2010, 70% of these cells were made from mono-

16 years ago

It is often the case when simulating charged coupled devices (CCDs) or image sensors, that a designer wishes to know how many electrons or holes are contained within an arbitrary

16 years ago

Anisotropic crystal etching is the common technique used in Micro Electromechanical systems (MEMS) manufacturing. It uses the property of some single crystal materials, like silicon, of having different etching rates

16 years ago

Developing ULSI silicon technology requires good control of dopant diffusion and minimizing defect formation during thermal oxidation. The use of high pressures of ambient gases can have a significant impact

16 years ago

SILVACO provides the tool ANSYSExporter which establishes the link between SILVACO software and ANSOFT ANSYS. ANSYSExporter is fully integrated within the SILVACO environment and can be called by means of

16 years ago

Organic light emitting diodes (OLEDs) have attracted great attention for full-color flat-panel displays since the demonstration of efficient electroluminescent devices [1]. Due to electrical doping of the electron and hole

16 years ago

In this paper, a physics based two dimensional (2-D) generic model of dual band mid wavelength and long wavelength infrared (MW-LW) photodetector based on HgCdTe has been reported. The paper

16 years ago

Q. How do I convert a value from one set of units into another? A. Use the DBINTERNAL CONVERT.UNITS command.

16 years ago

Meshing for process in ATHENA or electrical characterisation in ATLAS is one of the biggest challenges that a user faces. Poor meshing in both ATHENA and ATLAS can lead to

16 years ago

VICTORY Process, the 3D process simulator now includes a module for plasma etching. The module is designed to simulate plasma etching processes at the feature-scale size. The simulation in the

16 years ago

The Silvaco C-Interpreter (SCI) allows convenient and flexible definition of physical models and material parameters via an ANSI standard C-language interface. The SCI uses sophisticated techniques to assemble user defined