August 1998

When using the analytical implant tables in ATHENA the default model for the lateral implant range assumes a gaussian profile with a standard deviation equal to the vertical standard deviation

The shrinking critical dimensions of modern technology place a heavy requirement on optimizing the etching of narrow mask opening. In addition the aspect ratio of etches has been increased requiring

The ATLAS device simulation framework has been to improve the analysis the large signal transient behavior. These features include a simple specification for single frequency sinusoidal waveforms and frequency domain

CLEVER is designed to model interconnect parasitics by simulating the back end processing steps of custom cells in three dimensions. A 3D process simulator is used to realisticly reproduce the