2024/3/28 シルバコ・ソフトウェアを用いたTCADシミュレーションにより、活性領域に局在する欠陥の短絡現象への影響を調査しました。欠陥ドットが平坦なボディ/ドレイン界面、チャネル領域のSiC/酸化膜界面、湾曲したボディ/ドレイン界面に局在するさまざまなケースを検討し、位置に対する感度も調査しました。
This paper presents a TCAD modeling approach for HfO2-based ReRAM (Resistive Random Access Memory). For describing the switching and retention behaviors of a ReRAM cell, the proposed model includes the
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