November 1998

Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster.

28 years ago

HINTS & TIPS – November 1998

Q: How can anti-reflective coatings be modeled when simulating photodetectors in ATLAS/Luminous? How can detection efficiency be plotted?A: Earlier version of ATLAS were able to handle refraction and reflection of

28 years ago

New Model for High Energy Implants in ATHENA

In our earlier paper [1] a new Binary Collision Approximation (BCA) module was described. It was shown that models and algorithms implemented into the BCA model allow to accurately predict

28 years ago

Calibrating a Typical Bipolar Process Flow

A common request from TCAD (Technology Computer Aided Design) users is advise on how to calibrate the process flow and device simulator to a particular technology. In this article, guidelines

28 years ago

Accurate, High Speed Physics in FastBlaze

FastBlaze uses novel device simulation techniques to simulate typical MESFET and HEMT characteristics in less than a minute. To be a truly useful engineering tool this extremely high speed must

Validation of CLEVER Interconnect Parasitics with 0.18 µm Process Measurements Benoit Froment and Herve Jaouen – SGS-Thomson Microelectronics

CLEVER can perform accurate field solver extractions of resistance and capacitance from 3D structures generated from realistic process simulation. Comparison of CLEVER results with measurements made by SGS-Thomson Microelectronics were