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July 1, 2011

Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster.

15 years ago

Thermal Optimization on GaN HFET Using Flip Chip and Through Wafer via Structures

GaN heterojunction field effect transistors (HFETs) have been under extensive investigation because of their projected superb performances as high-power RF devices. The inherently high breakdown field arising from the wide

15 years ago

3D Simulation of Ion Enhanced Chemical Etching with VICTORY Process

VICTORY Process is a tool for 3D simulation of the semiconductor industry’s technological processes. It allows stable and accurate modeling of the changes in a structure’s 3D geometry within etching

15 years ago

Simulation of Transient Diffusion Enhancement of Boron with VICTORY Process in 3D, with the Plus-One Implantation Damage Model and the Five-Stream Diffusion Model

VICTORY Process is a 3D process simulation tool which allows for an accurate simulation of the doping distributions in semiconductor devices. It is able to simulate both the insertion of