Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation you should consider updating to a later version of the software. These examples can be used by beginners and advanced users for product evaluation, teaching purposes, and self-training.

Required Modules

Victory Process

• 2D Physical Etch & Deposit

Victory Process supports a range of advanced physical etching models. This example provides an introduction to the syntax used for a range of these models.

This example includes:

-Ideal Wet Etch: etching with the material laterally and vertically etched the same amount, as specified by THICKNESS

-Isotropic etching model: a machine is specified with a user defined etch rate (eg microns per minute) of the material. Here a single material is specified. Lateral and vertical etch rate ratio is the same. The machine is then activated for a certain amount of time.

-Anisotropic etching model: a machine is specified with a user defined etch rate (eg microns per minute) of the material. Here a single material is specified. However, this model enables the user to define the RATIO in the machine model, this controls the lateral to vertical etch rate ratio. Again, the machine is then activated for a certain amount of time.

-Profile etch: As an alternative and for the final example here, avoiding the need for setting machine characteristics and models, an area can be defined in the structure to be removed, with the addition of smoothing between points, enable fast matching of complex profiles. Starting with a negative value means the mask is under etched (all points relative to mask edge), only three points are given, the loop is automatically closed, with the corners rounded by the value given by SMOOTH.DISTANCE

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