PG-Fig8-21.in : Monte Carlo implant, different order for B, As

PG-Fig8-21.in : Monte Carlo implant, different order for B, As

PG-Fig8-21.in : Monte Carlo implant, different order for B, As

Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation you should consider updating to a later version of the software. These examples can be used by beginners and advanced users for product evaluation, teaching purposes, and self-training.

Required Modules

Victory Process

  • 2D Diffusion & Implantation

From “Integrated Circuit Fabrication: Science and Technology by Plummer & Griffin, published by Cambridge University Press

The arsenic implant first creates damage that causes more scatter in the subsequent boron implant. The increased scattering causes the boron to find some of the side
channels and also creates a shallower boron peak.

Images

PG-Fig8-21-01.png
PG-Fig8-21_Bsecond.png
PG-Fig8-21_Bfirst.png

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