PG-Fig10-42-2D.in : Oxide deposition in a 2D trench

PG-Fig10-42-2D.in : Oxide deposition in a 2D trench

PG-Fig10-42-2D.in : Oxide deposition in a 2D trench

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Required Modules

Victory Process

  • 2D Physical Etch & Deposit

From “Integrated Circuit Fabrication: Science and Technology by Plummer & Griffin, published by Cambridge University Press

We will compare this to deposition in a 3D via
The parameters PAR_FOCUS=3.0 and STICKING=0.2 correspond to
the power n in the cosine(theta)^n and the sticking coefficient

Images

PG-Fig10-42-2D.png

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