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2019

Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster.

Device Simulation of Oxide Semiconductor TFTs: Device Modeling and Self-Heating Effects

May 22, 2018 This webinar shows how to use Silvaco simulators for OS TFT device simulation. The carrier-electron transport and electronic states of OSs are reflected in the mobility model

7 years ago

Stars of IP Party Tees Off in Las Vegas

May 21, 2019

Silvaco TCAD: Introduction and the Basics – Part 2

Part II of this webinar series takes a dive into creating a new device simulation deck. Attendees will learn how to use DeckBuild to write a fully functional

7 years ago

Silvaco Announces Worldwide SURGE Schedule for 2019

May 21, 2019

7 years ago

ClioSoft and Silvaco Collaborate to Integrate ClioSoft’s SOS Design Data Management Platform with Silvaco’s Analog Custom Design Tools

May 20, 2019

7 years ago

Samsung Foundry and Silvaco Begin Partnership to Launch Samsung Foundry Semiconductor IP

On Monday, May 13, Silvaco announced that the semiconductor design IP of Samsung Foundry is now marketed, licensed and supported through Silvaco. The addition of Samsung production-proven design IP complements

7 years ago

Samsung Foundry Begins Partnership with Silvaco to Launch their Semiconductor IP Assets

Samsung Foundry Begins Partnership with Silvaco to Launch their Semiconductor IP Assets Santa Clara, CA – May 13, 2019 – Silvaco Inc., a leading supplier of EDA software and design

7 years ago

Silvaco Presents Smart Solutions from Atoms to Systems at DAC 2019

May 13, 2019

7 years ago

New Whitepaper: Comprehensive Design Solutions for Display Technology

Silvaco has a large booth in the middle of the show floor at Display Week 2019 at the San Jose Convention Center, May 14-16. Our technology experts will discuss and

Silvaco TCAD: Introduction and the Basics – Part 1

Silvaco TCAD: Introduction and the Basics – A Tutorial in 3 Parts Part I – Overview of Silvaco TCAD Silvaco TCAD can be applied to a breadth and depth of