Testimonials

Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster. 

3 years ago

Numerical Algorithm to Perform Viscoelastic Analysis Viscous materials exhibit both viscous and elastic characteristics when undergoing deformation. The response of such materials to force is characterized by two distinct

3 years ago

New Features in the 2023 Baseline Release:

  • Section 1: Process Simulation – New Features in 2023 Baseline Release
  • Section 2: Device Simulation – New Features in 2023 Baseline Release

3 years ago

May 24, 2023

May 18, 2023 In this webinar, we present geometric etch models in the context of FinFET and memory applications. We demonstrate techniques to realize fin shaping, non-ideal etch profiles (bowing,

4 years ago

The past several years has seen a fast deployment of wide-bandgap power devices in fast chargers, electric vehicles, data centers and renewable energy processing. The performance of power devices is

4 years ago

It is common to run the process simulation for the part of a larger structure just to reduce the computation time. To account for the influence of parts of the

4 years ago

March 23, 2023 In this webinar, we will present the benefits of adopting SmartSpice’s unique 4-terminal TFT compact model, and we describe how SmartSpice Flex Modeling technology can be

4 years ago

The utilization of thin material layers is common in modern semiconductor device fabrication. Subsequent etching steps require an accurate modeling of these thin layers. Although level-set based process TCAD simulations

4 years ago

February 23, 2023 In this webinar, Sungwon Kong will discuss these technologies and how TCAD can be broadly applied to multiple detector topology and material sets, thereby enabling multiple end-user