Testimonials

Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster. 

2 years ago

Using Viso to Investigate, Analyze, and Solve Complex Parasitic Issues As process geometries shrink, the number of parasitic elements in a design and the complexity of their structures grow exponentially.

2 years ago

As the scaling of CMOS devices continues, the accuracy requirements for simulating ion implantation and diffusion processes have become increasingly stringent.