2 years ago
- Section 1: Process Simulation – New Features in 2024 Baseline Release
- Section 2: Device Simulation – New Features in 2024 Baseline Release
- Section 3: Victory DoE – New
2 years ago
2024/7/25 本ウェビナーで説明する新しいアプローチは、現在すでに実生産で使用されており、人工知能（AI）と機械学習（ML）を活用して製造工程の正確なモデルを生成します。このアプローチでは、実際の物理学と化学を考慮した製造工程のTCADデジタル・モデル（デジタル・ツイン）を使用します。
June 12, 2024
2 years ago
It is often the case that a design of experiments (DOE) is required to optimize the performance of a particular device. Sometimes this simply means tweaking the implant dose for
2 years ago
Recently a new diffusion model was introduced to Victory Process: the CMOS model. This model aims at taking on the challenges brought by the specificities of CMOS device processing such
2 years ago
May 8, 2024
3 years ago
April 30, 2024