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1998

Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster.

28 years ago

HINTS & TIPS – December 1998

Q: I took the example file mux4.gds from Expert's installation and tried the Edit-in-place operation. I entered into an instance of mux1, modified a box in it and exited from

28 years ago

LISA Powerful Script language for Expert

This article introduces the LISA (Language for Interfacing Silvaco Applications) command language and gives an overview of LISA features.

28 years ago

Expert Expanded with Client-Server Project/Library Management

The Expert layout processor v.2.0 introduces a client-server system for managing large projects in multiuser design environments. This system is a significant improvement and enhances productivity by providing concurrent access

28 years ago

HINTS & TIPS – November 1998

Q: How can anti-reflective coatings be modeled when simulating photodetectors in ATLAS/Luminous? How can detection efficiency be plotted?A: Earlier version of ATLAS were able to handle refraction and reflection of

28 years ago

New Model for High Energy Implants in ATHENA

In our earlier paper [1] a new Binary Collision Approximation (BCA) module was described. It was shown that models and algorithms implemented into the BCA model allow to accurately predict

28 years ago

Calibrating a Typical Bipolar Process Flow

A common request from TCAD (Technology Computer Aided Design) users is advise on how to calibrate the process flow and device simulator to a particular technology. In this article, guidelines

28 years ago

Accurate, High Speed Physics in FastBlaze

FastBlaze uses novel device simulation techniques to simulate typical MESFET and HEMT characteristics in less than a minute. To be a truly useful engineering tool this extremely high speed must

Validation of CLEVER Interconnect Parasitics with 0.18 µm Process Measurements Benoit Froment and Herve Jaouen – SGS-Thomson Microelectronics

CLEVER can perform accurate field solver extractions of resistance and capacitance from 3D structures generated from realistic process simulation. Comparison of CLEVER results with measurements made by SGS-Thomson Microelectronics were

28 years ago

HINTS & TIPS – October 1998

The HP4155/56 DC Analyzer can be configured with SMU and Pulse Generator expander box frame called HP41501A. The expander box can have different measurement unit options.

28 years ago

SPAYN Recent Developments

An important aspect of statistical process control in IC production is the ability to predict circuit performance variation in the manufacturing process. Two new features in SPAYN allow the user,