Yearly Archives: 1998
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1998
Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster.
28 years ago
HINTS & TIPS – December 1998
Q: I took the example file mux4.gds from Expert's installation and tried the Edit-in-place operation. I entered into an instance of mux1, modified a box in it and exited from
28 years ago
LISA Powerful Script language for Expert
This article introduces the LISA (Language for Interfacing Silvaco Applications) command language and gives an overview of LISA features.
28 years ago
Expert Expanded with Client-Server Project/Library Management
The Expert layout processor v.2.0 introduces a client-server system for managing large projects in multiuser design environments. This system is a significant improvement and enhances productivity by providing concurrent access
28 years ago
HINTS & TIPS – November 1998
Q: How can anti-reflective coatings be modeled when simulating photodetectors in ATLAS/Luminous? How can detection efficiency be plotted?A: Earlier version of ATLAS were able to handle refraction and reflection of
28 years ago
New Model for High Energy Implants in ATHENA
In our earlier paper [1] a new Binary Collision Approximation (BCA) module was described. It was shown that models and algorithms implemented into the BCA model allow to accurately predict
28 years ago
Calibrating a Typical Bipolar Process Flow
A common request from TCAD (Technology Computer Aided Design) users is advise on how to calibrate the process flow and device simulator to a particular technology. In this article, guidelines
28 years ago
Accurate, High Speed Physics in FastBlaze
FastBlaze uses novel device simulation techniques to simulate typical MESFET and HEMT characteristics in less than a minute. To be a truly useful engineering tool this extremely high speed must
28 years ago
Validation of CLEVER Interconnect Parasitics with 0.18 µm Process Measurements Benoit Froment and Herve Jaouen – SGS-Thomson Microelectronics
CLEVER can perform accurate field solver extractions of resistance and capacitance from 3D structures generated from realistic process simulation. Comparison of CLEVER results with measurements made by SGS-Thomson Microelectronics were
28 years ago
HINTS & TIPS – October 1998
The HP4155/56 DC Analyzer can be configured with SMU and Pulse Generator expander box frame called HP41501A. The expander box can have different measurement unit options.
28 years ago
SPAYN Recent Developments
An important aspect of statistical process control in IC production is the ability to predict circuit performance variation in the manufacturing process. Two new features in SPAYN allow the user,