Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation you should consider updating to a later version of the software. These examples can be used by beginners and advanced users for product evaluation, teaching purposes, and self-training.
Required Modules
Victory Process
- 3D Structure Editor
Victory RCx
VictoryRCx is used in this example to simulate an “L ” shaped metal region, often found in custom cells, which is insulated from the silicon substrate by a 0.5um oxide layer. The processing steps are very simple requiring only etching and deposition.
As with any VictoryRCx simulation the process etching steps are driven from a layout file. This file will be included in the support files when this example is loaded.
A basic etch and deposition model is used whereby a uniformly thick layer of metal is deposited and etched. This results in the classical “manhattan ” geometry where the rectangular shaped structures have the appearance of a Manhattan skyline.
Once the process simulation is complete the three-dimensional structure is saved with the Save statement and can be plotted.
Finally the interconnect parasitic extraction is carried out using the Interconnect statement. Firstly, however, the material parameters of silicon are defined using the Material statement so that in this case silicon “inherits ” the same material properties as silicon. In this example only the parasitic capacitance values are calculated from the field solver. During this calculation automatic mesh adaption is performed with the Adapt parameter whereby the mesh is modified until the error in the capacitance extraction is reduced to the default maximum of 5% of the capacitance. The structure and the SPICE netlist are then saved.
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