PG-Fig8-41.in : Transient Enhanced Diffusion (TED) of a P implant

PG-Fig8-41.in : Transient Enhanced Diffusion (TED) of a P implant

PG-Fig8-41.in : Transient Enhanced Diffusion (TED) of a P implant

Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation you should consider updating to a later version of the software. These examples can be used by beginners and advanced users for product evaluation, teaching purposes, and self-training.

Required Modules

Victory Process

  • 2D Diffusion & Implantation

From “Integrated Circuit Fabrication: Science and Technology by Plummer & Griffin, published by Cambridge University Press

5e13, 100keV tilt=7 for various diffusion times at 800C
TED is caused by implant damage
Main parameter is clust.fac=1, indicating the “+1 model “

Images

PG-Fig8-41-02.png
PG-Fig8-41-01.png
PG-Fig8-41_Phos.png
PG-Fig8-41_Phos_InterstitialClusters.png

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