PG-Fig10-42-3D.in : Oxide deposition in a 3D via

PG-Fig10-42-3D.in : Oxide deposition in a 3D via

PG-Fig10-42-3D.in : Oxide deposition in a 3D via

Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation you should consider updating to a later version of the software. These examples can be used by beginners and advanced users for product evaluation, teaching purposes, and self-training.

Required Modules

Victory Process

  • 3D Physical Etch & Deposit

Victory Mesh

  • 2D Meshing

From “Integrated Circuit Fabrication: Science and Technology by Plummer & Griffin, published by Cambridge University Press

We will compare to oxide deposition in a 2D trench
The parameters PAR_FOCUS=3.0 and STICKING=0.2 correspond
to the power n in cosine(theta)^n and the sticking coefficient

Images

PG-Fig10-42_Via_3D_CS3p0_S0p2.png
PG-Fig10-42_Via_2D_CS3p0_S0p2.png
PG-Fig10-42-3D-02.png
PG-Fig10-42_Trench_3D.png
PG-Fig10-42_Trench.png
PG-Fig10-42-3D-01.png

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