Monthly Archives: October 2026
Home > Search Results For
October 2026
Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster.
1 week ago
clex14.in : Non Planarized, Low k Dielectric Capacitance Analysis
Requires: CLEVER This example demonstrates the ability of CLEVER to deposit and field solve non planarised, multi-layer films for interconnect capacitance analysis using CLEVER. The simulation is run in 2D
1 week ago
clex15.in : Local Oxidation (LOCOS)
Requires: CLEVER This example demonstrates the analytical local oxidation model (LOCOS) included in CLEVER. Oxidation can be included in the process flow to more accurately model the geometry around the
1 week ago
clex16.in : SRAM Analysis for Back Annotation into SPICE model
Requires: CLEVER This example is a six-transistor, three metal, single poly SRAM cell. The cell consists of four NMOS and two PMOS transistors. The layout file defines various layers up
1 week ago
clex17.in : Creating the clex16 SRAM structure in Victory Process
Requires: CLEVER, VICTORYPROCESS Minimum Versions: Clever 3.10.13.A, VictoryProcess 7.7.6.A This example creates the same SRAM design as in clex16, but uses the Victory Process simulator to create a more realsitic
1 week ago
clex18.in : GDS2, netlist reduction and contact statement
Requires: CLEVER We show in this example that CLEVER can be used with a gds2 layout format as input. The commands used are GDS2=”layout.gds” and cell=”cell_number1″ which allow the user
1 week ago
clex19.in : Mesh Refinement
Requires: CLEVER This example illustrates the adaptative meshing capability of CLEVER. You can see the evolution of the mesh refinement using the command: interconnect capacitance AdaptC=0.04 structure=”clex19″. As a result
1 week ago
clex20.in : Simulating Micro-Loading Effects using Advanced Etching
Requires: CLEVER Micro-loading etching effects describe the phenomenon whereby the effective material etch rate depends on the hole size of the pattern masking layer. This can be simulated using the
1 week ago
clex21.in : Calculating Well Isolation and Source/Drain Capacitance
Requires: CLEVER Version 3.6.10 or Later This example demonstrates how to:- Include well isolation depletion capacitance in the calculation. Include source/drain depletion capacitance in the calculation. Specify cyclical cell boundary
1 week ago
clex22.in : Liquid Crystal (LCD) Field Dependent Capacitance
Requires: CLEVER, VICTORYPROCESS This example illustrates using Clever to simulate the physics in Liquid Crystal films. Liquid crystal films consist of long molecules, called directors which rotate in response to
1 week ago
clex23.in : Optical Simulation of Liquid Crystal in the In-plane Switching (IPS) Mode
Requires: Victory Process / Clever Minimum Versions: Victory Process 7.14.3.R / Clever 3.11.6.C or Later This example demonstrates the electrical and optical simulation of a liquid crystal (LC) cell in