Daily Archives: October 1, 2018
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October 1, 2018
Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster.
8 years ago
Process Variation, Alignment and BEOL Effects on Circuit Level Performance
As process nodes continue to shrink, the requirement for additional physics is gradually creeping into each stage of the design process. By way of illustration, TCAD simulations are becoming more
8 years ago
Touch Panel Capacitance Extraction in Hipex Full Chip Extraction Tool Using Stellar Field Solver
The previously standalone Stellar GUI based field solver tool for parasitic extraction is now integrated into Hipex (Silvaco’s full chip extraction tool) in Expert GUI. In Hipex, user can choose
8 years ago
Dynamic Analysis of Liquid Crystal Pixels
We have demonstrated in previous articles the static electrical and optical simulation of LC cells [1][2]. The last piece of the function for a comprehensive analysis of an LC pixel
8 years ago
Hints, Tips and Solutions – Adding An Impurity to a Diffusion Model and Enable Diffusion of a New Impurity in a Specific Material
OBJECTIVE Add an impurity (H) to a material (silicon) for a diffusion model (Fermi). The description below refers to Victory Process version 7.27.X.