Silvaco TCAD: Introduction and the Basics
– A Tutorial in 3 Parts
Part III&TCAD Process Simulation
Silvaco TCAD can be applied to a breadth and depth of applications useful in the development of semiconductor technologies. TCAD has been proven to be a powerful tool to provide in-depth understanding of device fabrication and operation. When applied by engineers to their Semiconductor R&D needs, TCAD can provide insights difficult or even impossible to achieve empirically. TCAD can help enhance device performance, increase yield and reduce time to market.
However applying TCAD is a complex learned skill and engineers must apply their own skill and experience as a solid-state physicist, electrical engineer or circuit designer. Applying that knowledge to harness the TCAD infrastructure will their simulation goals to be achieved. TCAD software combines industry and academic physics knowledge, advanced numerical methods, user interfaces, and automation to allow engineers to get the answers they need.
In this 3-part webinar series, viewers will be introduced to the suite of Silvaco TCAD software, and offered starter training and tutorial. The series will allow them to approach the complexity of suing TCAD from a good starting point and to learn quickly and confidently how to achieve successful TCAD simulation
- Part I – Overview of Silvaco TCAD
- Part II – TCAD Device Simulation
- Part III – TCAD Process Simulation
Part III&TCAD Process Simulation
Part III of this webinar series will provide a discussion and instruction to TCAD process simulation with Victory Process. The session will walk through the basics of semiconductor process simulation, structure design and process emulation, and more.
Simulation aspects of a fabrication process entails understanding of the physics, numerical methods and structural meshing to optimally simulate a semiconductor device fabrication process. The webinar discusses the flow of a typical input deck, describes the operation of various parameters, walks through visualizing and analyzing structures via Tonyplot and provides the basic understanding required to begin working on Victory Process.
What attendees will learn:
- Key operations of device process simulation using Victory Process tool
- Complete flow of Victory process input deck, run time output and result analysis
- Information about optimal structural meshing
- Analyzing device structures using Tonyplot, cutlines, doping profiles, potential profiles etc
- Examples and resources available to users
Udita Kapoor joined Silvaco as a Field Applications Engineer within Silvaco’s TCAD division in 2019. She is based out of the Santa Clara office, California. Prior to Silvaco, Udita was at Rochester Institute of Technology, Rochester, New York, where she graduated with a Masters in Microelectronics. She is responsible for supporting TCAD for process simulation, training and supporting users in fabrication process simulations for various technologies. Udita has worked on simulation of classical and non-classical device simulations. She has worked with material characterization using atomistic modeling and device simulation for 2-D devices.
When: May 28, 2019
WHO SHOULD ATTEND:
Academics, engineers, material scientists, and management interested in physical simulations for any semiconductor technologies