Leakage Current Calibration Procedures of Amorphous Silicon Thin-Film Transistors

Leakage Current Calibration Procedures of Amorphous Silicon Thin-Film Transistors

Leakage Current Calibration Procedures of Amorphous Silicon Thin-Film Transistors

Leakage Current Calibration Procedures of Amorphous Silicon Thin-Film Transistors

Introduction

Amorphous silicon Thin-Film Transistors (a-Si TFTs) are widely used as the switching device of liquid crystal display (LCD) technology. For development and analysis of a-Si TFTs, many research groups are trying to understand the physical mechanisms of a-Si TFTs. In particular, leakage current behavior is a major consideration for switching devices like a-Si TFTs. To analyze the leakage current mechanisms, calibration with numerical simulation is required.

In the next section, we describe a-Si TFT density of states (DOS) models and their implementation in ATLAS. Some examples of calibration procedures using them are also described.

Download Simulation Standard

Leakage Current Calibration Procedures of Amorphous Silicon Thin-Film Transistors

Introduction

Amorphous silicon Thin-Film Transistors (a-Si TFTs) are widely used as the switching device of liquid crystal display (LCD) technology. For development and analysis of a-Si TFTs, many research groups are trying to understand the physical mechanisms of a-Si TFTs. In particular, leakage current behavior is a major consideration for switching devices like a-Si TFTs. To analyze the leakage current mechanisms, calibration with numerical simulation is required.

In the next section, we describe a-Si TFT density of states (DOS) models and their implementation in ATLAS. Some examples of calibration procedures using them are also described.

Download Simulation Standard

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