4 weeks ago
Requires: Utmost IV, SmartSpice, SmartView Minimum Versions: Utmost IV 1.10.6.R, SmartSpice 4.10.2.R, SmartView 2.28.2.R This example describes how to use the model check module to simlulate some mosfet characteristics. The
4 weeks ago
Requires: Utmost IV, SmartSpice, SmartView Minimum Versions: Utmost IV 1.10.6.R, SmartSpice 4.10.2.R, SmartView 2.28.2.R This example describes how to use the model check module to simlulate and display some mosfet
4 weeks ago
Requires: Utmost IV, SmartSpice, SmartView Minimum Versions: Utmost IV 1.10.6.R, SmartSpice 4.10.2.R, SmartView 2.28.2.R This example describes how to use the model check module to check for binned model threshold
4 weeks ago
Requires: Utmost IV, SmartSpice, SmartView Minimum Versions: Utmost IV 2.19.2.R, SmartSpice 5.2.0.R, SmartView 2.2207.0.R This example shows how to use the Utmost IV Corner and Retargeting module to generate an
4 weeks ago
Requires: Utmost IV, SmartSpice, SmartView Minimum Versions: Utmost IV 2.19.2.R, SmartSpice 5.2.0.R, SmartView 2.2207.0.R This example shows how to use the Utmost IV Corner and Retargeting module to generate typical,
4 weeks ago
Requires: Utmost IV, SmartSpice, SmartView Minimum Versions: Utmost IV 2.19.2.R, SmartSpice 5.2.0.R, SmartView 2.2207.0.R This example shows how to perform the parameter selection needed in the Utmost IV Corner and
4 weeks ago
Requires: Utmost IV, SmartSpice, SmartView Minimum Versions: Utmost IV 2.19.2.R, SmartSpice 5.2.0.R, SmartView 2.2207.0.R This example shows how to use the Utmost IV Corner and Retargeting module to generate typical,
4 weeks ago
Requires: VWF, ATHENA, This example demonstrates simulation of stresses in a test MOSFET structure with an embedded SiGe layer. All important geometrical characterisics of the test structure, including thicknesses of
4 weeks ago
Requires: VWF, ATHENA, ATLAS The objective is to optimize 4 process parameters (gate oxide time, temperature, Vt adjust implant dose, and energy) in order to get a targetted Vt of
4 weeks ago
Requires: VWF, ATHENA, ATLAS The objective of this example is to optimize 4 process parameters (gate oxide time and temp as well as Vt adjust implant dose and energy) in
4 weeks ago
Requires: VWF, CLEVER This example demonstrates the use of CLEVER within VWF. You should be familiar with CLEVER syntax before running this example. Please refer to the CLEVER manual for
4 weeks ago
Requires: VWF, QUEST This example uses an Expert LISA script in QUEST to generate a parametrized gds layout. In order to build an inductance model, or simply make a variation