Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation you should consider updating to a later version of the software. These examples can be used by beginners and advanced users for product evaluation, teaching purposes, and self-training.
Required Modules
Victory Process
- 3D Structure Editor
Victory RCx
This example creates the same SRAM design as in VRCx_ex16, but uses the Victory Process simulator to create a more realistic structure.
The more realistic structure is a result of three features in Victory Process:
Firstly, an optical solver creates an optical intensity map during photoresist exposure from a user specifiable deep-UV light source, through a lens of user specifiable numerical aperture (0.5 in this particular case). The mask can also be deliberately defocussed by a user specifiable distance in um, above or below the surface of the photoresist, using the “maskdefocus ” parameter.
Secondly, photoresist mask development profile is calculated from an intensity contour map specifiable by the user as developing somewhere between zero intensity, and full intensity represented by specifying the “criticalintensity ” parameter. A value of 0.5 was used in this example.
Thirdly once the photoresist mask pattern has been simulated, a geometric etch feature is used to create sloped sidewalls of 87 degrees relative to horizontal.
Images
