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VP_Implant_ex08.in : Si Wafer Orientation for Implantation

VP_Implant_ex08.in : Si Wafer Orientation for Implantation

VP_Implant_ex08.in : Si Wafer Orientation for Implantation

Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation you should consider updating to a later version of the software. These examples can be used by beginners and advanced users for product evaluation, teaching purposes, and self-training.

Required Modules

Victory Process

  • 2D Diffusion & Implantation

This example accompanies the Simulation Standard article: “Setting up the Wafer Orientation: Applications to Ion Implantation ” Volume 34, Number 3, April 2024 available from Silvaco.com

Understanding the effects of crystal orientation in different materials, especially those with diamond and hexagonal structures, is essential due to the multitude of specifications in commercially available wafers.

It is critical that the wafer orientation and implantation conditions are correctly set due to the impact on profile variations in channelling and non-channelling directions. This example set demonstrates the effect on the doping profile due to variation in crystal orientation.

Images

VP_Implant_ex08_01.png

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