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VP_Etch_Dep_ex09.in : Introduction to geometric etching models

VP_Etch_Dep_ex09.in : Introduction to geometric etching models

VP_Etch_Dep_ex09.in : Introduction to geometric etching models

Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation you should consider updating to a later version of the software. These examples can be used by beginners and advanced users for product evaluation, teaching purposes, and self-training.

Required Modules

Victory Process

  • Core Simulator

This example demonstrates different geometric etching models provided by Victory Process. The example is set up with a simple structure consisting of a silicon surface with a window of polysilicon etched out and a conformal layer of nitride deposited in it.

This layer is etched using different etching models namely min, max, dry, wet and strip.

Min model etches the structure down to a depth (thickness) as measured from the lowest plane of the material (selective etching) or the lowest plane of the structure (non-selective etching).

Similarly, max model etches the structure down to a depth (thickness) measured from the highest point/plane of the material (selective etching) or the lowest plane of the structure (non-selective etching).

Dry and wet etch models enable anisotropic etching and isotropic etching respectively.

Lastly, strip model removes all of the exposed material specified.

Images

VP_Etch_Dep_ex09_02.png
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VP_Etch_Dep_ex09_03.png
VP_Etch_Dep_ex09_06.png
VP_Etch_Dep_ex09_01.png

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