Home> >

VP_Etch_Dep_ex07.in : Ion Enhanced Chemical Etching Example

VP_Etch_Dep_ex07.in : Ion Enhanced Chemical Etching Example

VP_Etch_Dep_ex07.in : Ion Enhanced Chemical Etching Example

Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation you should consider updating to a later version of the software. These examples can be used by beginners and advanced users for product evaluation, teaching purposes, and self-training.

Required Modules

Victory Process

  • 3D Physical Etch & Deposit

This example demonstrates the ion enhanced chemical etching model.

The enhancement effect is demonstrated by performing two simulations with different ion acceleration. Moreover, this example illustrates the generation of round mask features.

List of key syntax:

INIT: Defines simulation volume and meshing resolution

SPECIFYMASKPOLY: Defines mask layer polygon

SAVE: Saves simulation status

EXPORT: Exports simulation status to visualize

DEPOSIT: Deposition with geometrical mode

Images

VP_Etch_Dep_ex07_01.png
VP_Etch_Dep_ex07_02.png
VP_Etch_Dep_ex07_04.png
VP_Etch_Dep_ex07_03.png

Related Articles