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VP_Etch_Dep_ex04.in : Introduction to physical deposition models

VP_Etch_Dep_ex04.in : Introduction to physical deposition models

VP_Etch_Dep_ex04.in : Introduction to physical deposition models

Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation you should consider updating to a later version of the software. These examples can be used by beginners and advanced users for product evaluation, teaching purposes, and self-training.

Required Modules

Victory Process

  • 2D Physical Etch & Deposit

Victory Process supports a range of advanced physical deposition models. This example provides an introduction to the syntax used for a range of these models.

This example includes:

-Conformal: time and deposition rate are specified. The surface is covered by a uniform thickness. Does not take into account shading effects.

-Non-conformal: an extension to the conformal model where RATIO is also specified. This determines the degree of non-uniformity in step coverage. Here RATIO=0.5, therefore vertical sidewalls will be x2 thinner than the horizontal plane.

-Primary-Ballistic-Mode – A single particle model corresponding to the case where the spatial velocity distribution of the reactive particles is isotropic within the reactor. Takes into account shading effects.

-Sputter Deposition: a numerical approximation of sputter deposition using a cosinepower function, shading and the how focused the flux is around the vertical axis are taken into account.

Images

VP_Etch_Dep_ex04_01.png
VP_Etch_Dep_ex04_04.png
VP_Etch_Dep_ex04_03.png
VP_Etch_Dep_ex04_02.png

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