Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation you should consider updating to a later version of the software. These examples can be used by beginners and advanced users for product evaluation, teaching purposes, and self-training.
Required Modules
Victory Process
- 2D Diffusion & Implantation
This example demonstrates Transient Enhanced Diffusion (TED) of boron due to ion implantation. The ion implantation of any dopant will create damage to the lattice. This means out of equilibrium defects, and because dopants use defects to diffuse, the diffusion rate will be enhanced. However, because the out of equilibrium defects will converge towards equilibrium (recombination in bulk or at interfaces etc.) this means that this enhanced diffusion is transient.
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