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GaN_Power_ex11.in : Pi-Gate p-GaN HEMT Process and Device Simulation

GaN_Power_ex11.in : Pi-Gate p-GaN HEMT Process and Device Simulation

GaN_Power_ex11.in : Pi-Gate p-GaN HEMT Process and Device Simulation

Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation you should consider updating to a later version of the software. These examples can be used by beginners and advanced users for product evaluation, teaching purposes, and self-training.

Required Modules

Victory Process

  • 2D Diffusion & Implantation

Victory Mesh

  • 2D Remeshinig

Victory Device

  • 2D Simulator
  • 2D MixedMode

Structure based on the following paper: K. Sehra et al, “A Π-shaped p-GaN HEMT for reliable enhancement mode operation “, Microelectronics Reliability, Volume 133, 2022, 114544, https://doi.org/10.1016/j.microrel.2022.114544

RDSon calculated based on methodology presented in following paper: Ronchi, N., Bakeroot, B., You, S., Hu, J., Stoffels, S., Wu, T.-.-L., De Jaeger, B. and Decoutere, S. (2017), Optimization of the source field-plate design for low dynamic RDS-ON dispersion of AlGaN/GaN MIS-HEMTs. Phys. Status Solidi A, 214: 1600601. https://doi.org/10.1002/pssa.201600601

The example demonstrates building a Pi-Gate P-GaN HEMT device using Victory Process and Victory Mesh.

The example also demonstrates how to perform RDSon simulation using TCAD for a p-GaN HEMT. It is seen that with repeated pulsed operation of the GaN HEMT, the drain current reduces, revealing an increase in the RDSon as the traps fill with a 10% duty cycle.

– Process Simulation:
complete process flow with in-deck mask creation for Pi gate structure.

– Device Simulation:
Pulsed Transient simulation for RDSon modelling.

Images

GaN_power_ex11_02.png
GaN_power_ex11_01.png

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