Requires: CLEVER Micro-loading etching effects describe the phenomenon whereby the effective material etch rate depends on the hole size of the pattern masking layer. This can be simulated using the

Requires: CLEVER Version 3.6.10 or Later This example demonstrates how to:- Include well isolation depletion capacitance in the calculation. Include source/drain depletion capacitance in the calculation. Specify cyclical cell boundary

Requires: CLEVER, VICTORYPROCESS This example illustrates using Clever to simulate the physics in Liquid Crystal films. Liquid crystal films consist of long molecules, called directors which rotate in response to

Requires: Victory Process / Clever Minimum Versions: Victory Process 7.14.3.R / Clever 3.11.6.C or Later This example demonstrates the electrical and optical simulation of a liquid crystal (LC) cell in