October 7, 2026

Requires: CLEVER This example demonstrates the analytical local oxidation model (LOCOS) included in CLEVER. Oxidation can be included in the process flow to more accurately model the geometry around the

Requires: CLEVER This example is a six-transistor, three metal, single poly SRAM cell. The cell consists of four NMOS and two PMOS transistors. The layout file defines various layers up

Requires: CLEVER, VICTORYPROCESS Minimum Versions: Clever 3.10.13.A, VictoryProcess 7.7.6.A This example creates the same SRAM design as in clex16, but uses the Victory Process simulator to create a more realsitic

Requires: CLEVER We show in this example that CLEVER can be used with a gds2 layout format as input. The commands used are GDS2=”layout.gds” and cell=”cell_number1″ which allow the user

Requires: CLEVER This example illustrates the adaptative meshing capability of CLEVER. You can see the evolution of the mesh refinement using the command: interconnect capacitance AdaptC=0.04 structure=”clex19″. As a result

Requires: CLEVER Micro-loading etching effects describe the phenomenon whereby the effective material etch rate depends on the hole size of the pattern masking layer. This can be simulated using the

Requires: CLEVER Version 3.6.10 or Later This example demonstrates how to:- Include well isolation depletion capacitance in the calculation. Include source/drain depletion capacitance in the calculation. Specify cyclical cell boundary

Requires: CLEVER, VICTORYPROCESS This example illustrates using Clever to simulate the physics in Liquid Crystal films. Liquid crystal films consist of long molecules, called directors which rotate in response to

Requires: Victory Process / Clever Minimum Versions: Victory Process 7.14.3.R / Clever 3.11.6.C or Later This example demonstrates the electrical and optical simulation of a liquid crystal (LC) cell in