Dry etching is commonly used in semiconductor processing to generate deep trenches with good anisotropy. Dry etching is applied to many semiconductor technologies including Advanced FinFETs, 3D NAND, and vertical Silicon and Silicon Carbide power devices.
September 9, 2020
September 17, 2020 | 13:00 – 13:30 (JST)
The accuracy of rule-based full-chip parasitic capacitance extraction tools including Silvaco’s Hipex is highly dependent on the description of the rule files.
October 13, 2020 | 10:00 am – 10:30 am (PST)
As computation requirements continue to build and memory systems are operating at ever higher frequencies, high-performance memory subsystems that consume minimal power consumption and small silicon area are a necessary requirement.
August 26, 2020
2020 TCAD Baseline Release
Section 1: Process Simulation – New Features in 2020 Baseline Release
2020 TCAD Baseline Release
Section 2: Meshing – New Features in 2020 Baseline Release
2020 TCAD Baseline Release Section 3:
Device Simulation – New Features in 2020 Baseline Release
August 27, 2020 | 10:00 am – 10:30 am (PDT)
This webinar will provide a presentation on challenges and solutions associated with the development of high-speed interface design in modern SOCs
July 28, 2020 | 10:00 am – 10:30 am (PDT)
This webinar will provide a discussion of common methods used to secure an AMBA-based hardware and software system design.