2024 TCAD Baseline Release
- Section 1: Process Simulation – New Features in 2024 Baseline Release
- Section 2: Device Simulation – New Features in 2024 Baseline Release
- Section 3: Victory DoE – New Features in 2024 Baseline Release
Entries by Gigi Boss
Silvaco Reports Second Quarter 2024 Financial Results
August 7, 2024
Learn How Micron Utilizes Silvaco’s Fab Technology Co-Optimization for Development and Manufacturing of Memory Technologies
August 29, 2024
This webinar highlights how Micron Technology utilizes Silvaco’s Fab Technology Co-Optimization (FTCOTM) platform for the development and manufacturing of advanced memory technologies.
Applying Artificial Intelligence in Fab Technology Co-Optimization (FTCOTM)
July 25, 2024
The common approach to optimize a fabrication process involves process and fab engineers creating and setting up Design of Experiments (DoEs) using a trial-and-error approach. This approach often leads to costly iterations since wafer fabrication is both expensive and time-consuming. The new approach described in this webinar, already in production use today, leverages artificial intelligence (AI) and machine learning (ML) to generate an accurate model of a fabrication step.
Silvaco Reports First Quarter 2024 Financial Results
June 20, 2024
How Can I Re-Use Individual Monte-Carlo 3D Implant Profiles?
It is often the case that a design of experiments (DOE) is required to optimize the performance of a particular device. Sometimes this simply means tweaking the implant dose for threshold voltage or other minor adjustments, but in other cases it can mean tweaking such things as high energy deep well implants.
Join Silvaco at DAC 2024
May 30, 2024
Comparison of Models for Fluorine Effect on Dopant Diffusion in CMOS Processes
Recently a new diffusion model was introduced to Victory Process: the CMOS model. This model aims at taking on the challenges brought by the specificities of CMOS device processing such as steep temperature ramps, short annealings or shallow implantations.