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Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster.

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1 week ago

Full-Chip Curvilinear Patterning: From Design-Stage Exploration to Process-Variation Analysis

Abstract Curvilinear mask shapes are moving into production at advanced nodes, and they stress correction, verification, and mask rule checking (MRC) flows built for rectilinear geometry. This webinar presents Silvaco’s

Modeling Webinars, TCAD Webinars, Webinars

1 month ago

TCAD-Aware SPICE Model Extraction with Utmost IV: From Manufacturing to Surrogate Circuit Modeling

TCAD-Aware SPICE Model Extraction with Utmost IV: From Manufacturing to Surrogate Circuit Modeling Abstract Accurate compact models are essential for translating device behavior into trustworthy circuit simulation, but extracting a

Webinars, Webinars, Webinars

1 month ago

From Standard Cells to Strategic Advantage: Building Differentiated PPA Value

Abstract: An IC’s optimal balance of power, performance, and area (PPA) depends on the target application, so building them from generic standard cell libraries inevitably leaves customer value unrealized. With

TCAD Webinars, Webinars

3 months ago

AI-Powered Surrogates: From Process Geometry to I‑V Curves

AI-Powered Surrogates: From Process Geometry to I‑V Curves Abstract Modern semiconductor development requires rapid exploration of large design spaces while maintaining the predictive accuracy of physics-based simulation. In this webinar,

TCAD Webinars, Webinars

3 months ago

Simulation of Plasma Chambers for Predictive Simulation of Semiconductor Manufacturing

Simulation of Plasma Chambers for Predictive Simulation of Semiconductor Manufacturing Process engineers, plasma chamber designers, and plasma device users are faced with the challenge of designing optimal geometric configurations, with