TCAD工艺仿真对于开发新技术以及维护现有半导体工艺至关重要。制造过程的虚拟化帮助企业实现了半导体工艺“数字孪生”，工程师可以更好地理解工艺中的变化，优化器件性能，提高生产效率，同时缩短研发周期和制造周期。
解析注入模式
蒙特卡罗注入模式
Application Examples
Presentations
DTCO Tool Flow – Single Run-Time Environment for Design Technology Co-Optimization
Optical Simulations – Light Emitting and Absorbing Devices
Power Device Solutions – Full TCAD to SPICE Flow
Parasitic Extraction – Full Chip and Cell Level RC Extraction
Process Simulation Options – Four Ways to Create a Physical Structure
Published Papers
Simulation Standard Technical Journal
Webinars
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Setting up the Wafer Orientation: Applications to Ion Implantation
Optoelectronic Component Design for Photonic Integrated Circuits
Advanced TCAD Modeling of HfO2-based ReRAM: Coupling Redox Reactions and Thermal Effects
Numerical Algorithm to Perform Viscoelastic Analysis