TCAD 공정 시뮬레이션은 기존 반도체 공정의 유지보수 및 신기술 개발에 매우 중요합니다. 가상의 제조 공정을 통해서 현실의 반도체 공정을 구현할 수 있습니다. 공정의 변화를 명확하게 반영할 수 있습니다; 즉, 소자 성능을 극대화하고 제조 수율을 높이는 동시에 엔지니어링 주기와 시간을 최소화합니다.
분석적 주입 모드
Monte-Carlo (MC) 주입 모드
프리젠테이션
DTCO Tool Flow – Single Run-Time Environment for Design Technology Co-Optimization
Optical Simulations – Light Emitting and Absorbing Devices
Power Device Solutions – Full TCAD to SPICE Flow
Parasitic Extraction – Full Chip and Cell Level RC Extraction
Process Simulation Options – Four Ways to Create a Physical Structure
관련 논문
Simulation Standard Technical Journal
웨비나
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Setting up the Wafer Orientation: Applications to Ion Implantation
Optoelectronic Component Design for Photonic Integrated Circuits
Advanced TCAD Modeling of HfO2-based ReRAM:Coupling Redox Reactions and Thermal Effects
Numerical Algorithm to Perform Viscoelastic Analysis