Simulation Standard

This edition introduces trajectory replication in Victory Process Monte Carlo ion implantation, with a focus on:

• Reducing computation time by reusing ion paths in similar regions
• Maintaining physical

In this article, we will present application examples of stress analysis in Victory Process.

As the scaling of CMOS devices continues, the accuracy requirements for simulating ion implantation and diffusion processes have become increasingly stringent.

Victory Extract is a new tool for the 2024 baseline release. Victory Extract unifies the older extraction offerings from DeckBuild (extract), Victory Process (extract3d) and Victory Mesh (extract3d) and introduces

This article introduces a DPT-based simulation method to perform the transient switching characteristics of an IGBT device. It also provides standard templates for power device switching characteristics and performance assessment

• Section 1: Process Simulation – New Features in 2024 Baseline Release
• Section 2: Device Simulation – New Features in 2024 Baseline Release
• Section 3: Victory DoE – New

It is often the case that a design of experiments (DOE) is required to optimize the performance of a particular device. Sometimes this simply means tweaking the implant dose for

Recently a new diffusion model was introduced to Victory Process: the CMOS model. This model aims at taking on the challenges brought by the specificities of CMOS device processing such

Properly setting the wafer orientation in Victory Process (VP) is critical for various processes such as ion implantation, etching, and deposition. For ion implantation in particular, the determination of the

Photonic integrated circuits (PICs) are a key enabling technology for a broad range of current and next-generation products. Combining semiconductor materials and manufacturing processes common to microelectronics with the encoding,