TCAD工艺仿真对于开发新技术以及维护现有半导体工艺至关重要。制造过程的虚拟化帮助企业实现了半导体工艺“数字孪生”，工程师可以更好地理解工艺中的变化，优化器件性能，提高生产效率，同时缩短研发周期和制造周期。
解析注入模式
蒙特卡罗注入模式
演示文稿
DTCO Tool Flow – Single Run-Time Environment for Design Technology Co-Optimization
Optical Simulations – Light Emitting and Absorbing Devices
Power Device Solutions – Full TCAD to SPICE Flow
Parasitic Extraction – Full Chip and Cell Level RC Extraction
Process Simulation Options – Four Ways to Create a Physical Structure
产品介绍
Victory Process – Process Simulation
Victory Mesh – Meshing and Solid Modeling
Victory Device – Device Simulation
Victory Device – Simulation Modules
Victory Atomistic – Nanostructure Simulation
Victory RCx Pro – RC Extractor for Realistic 3D Structures
Victory DoE – Design of Experiments
已发表论文
技术刊物Simulation Standard
网络研讨会
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基于双脉冲法的IGBT开关仿真
2024 TCAD基准版本软件发布
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