Q: I took the example file mux4.gds from Expert’s installation and tried the Edit-in-place operation. I entered into an instance of mux1, modified a box in it and exited from EIP. There are options to change the edited cell and to save instance under another cell name.
This article introduces the LISA (Language for Interfacing Silvaco Applications) command language and gives an overview of LISA features.
The Expert layout processor v.2.0 introduces a client-server system for managing large projects in multiuser design environments. This system is a significant improvement and enhances productivity by providing concurrent access to the same design data by several designers while maintaining data integrity and ensuring security for intellectual property.
Q: How can anti-reflective coatings be modeled when simulating photodetectors in ATLAS/Luminous? How can detection efficiency be plotted?A: Earlier version of ATLAS were able to handle refraction and reflection of rays during the optical simulation in Luminous.
In our earlier paper [1] a new Binary Collision Approximation (BCA) module was described. It was shown that models and algorithms implemented into the BCA model allow to accurately predict implant profiles with significant channeling as well as the dose and screen oxide thickness dependencies for relatively low implant energies.
A common request from TCAD (Technology Computer Aided Design) users is advise on how to calibrate the process flow and device simulator to a particular technology. In this article, guidelines are presented for calibration of process and device simulations for a typical poly-emitter bipolar process.
FastBlaze uses novel device simulation techniques to simulate typical MESFET and HEMT characteristics in less than a minute. To be a truly useful engineering tool this extremely high speed must be achieved without compromising the accuracy of the physical models.
CLEVER can perform accurate field solver extractions of resistance and capacitance from 3D structures generated from realistic process simulation. Comparison of CLEVER results with measurements made by SGS-Thomson Microelectronics were done to validate the simulator.
The HP4155/56 DC Analyzer can be configured with SMU and Pulse Generator expander box frame called HP41501A. The expander box can have different measurement unit options.
An important aspect of statistical process control in IC production is the ability to predict circuit performance variation in the manufacturing process. Two new features in SPAYN allow the user, for a particular circuit performance parameter, to rapidly calculate an estimate of the standard deviation and also generate a yield distribution utilising Monte Carlo simulations, thus allowing a full statistical analysis of the circuit performance parameter distribution.