It is usually assumed that the poly gate in a MOSFET is doped at a concentration such that depletion in the gate either does not occur or that any depletion effects can safely be ignored. This article aims to quantify poly depletion effects for typical sub-micron device dimensions using ATHENA and ATLAS process and device simulators.
Mesh control in process simulators is one of the major issues tackled by any user. Over the years the meshing algorithms with SSuprem4 and ATHENA have been improved to the stage where most arbitrary structures can be solved. New approaches such as automated ADAPTIVEMESH algorithms or standalone programs such as DevEdit exist to help users.
https://silvaco.com/wp-content/uploads/simulationstandard/simstd_feb_1998_a4.jpg16691255Ingrid Schwarz/wp-content/uploads/2019/11/silvaco-logo.pngIngrid Schwarz1998-02-02 16:51:442020-12-22 13:09:05Mesh Control in ATHENA Avoiding Problems and What to do If they Occur
Taveren Technology, Inc., a startup company based in Austin, Texas is busy developing the next generation performance characterization tool suite.
https://silvaco.com/wp-content/uploads/simulationstandard/simstd_jan_1998_a3.jpg16691338Ingrid Schwarz/wp-content/uploads/2019/11/silvaco-logo.pngIngrid Schwarz1998-01-03 14:26:142020-12-19 11:48:28CellRATER from Taveren Technology fast, Accurate Cell Library Characterization for Deep Submicron Timing Flow Improvement
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