Posts
Learn How to Efficiently Achieve Accurate Experimental Etch Profiles in FinFET and Memory Applications with Victory TCAD Solution
August 11, 2022
In this webinar, we present these geometric etch models in the context of FinFET and memory applications. We demonstrate techniques to realize fin shaping, non-ideal etch profiles (bowing, twisting), and self-aligned processes (multi-patterning).
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Process Simulation
Victory Process 2D & 3D Layout-Driven Simulator
TCAD Process simulation is crucial to develop new technologies, as well as maintain existing semiconductor processes. Virtualizing the manufacturing process allows organizations to maintain a “digital twin” of their semiconductor process. Changes in process can be well understood; maximizing device performance, increase manufacturing yield, while minimizing number of engineering cycles and cycle time.