文章
Learn How to Efficiently Achieve Accurate Experimental Etch Profiles in FinFET and Memory Applications with Victory TCAD Solution
August 11, 2022
In this webinar, we present these geometric etch models in the context of FinFET and memory applications. We demonstrate techniques to realize fin shaping, non-ideal etch profiles (bowing, twisting), and self-aligned processes (multi-patterning).
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工艺仿真器
Victory Process 2D & 3D 版图驱动仿真器
TCAD工艺仿真对于开发新技术以及维护现有半导体工艺至关重要。制造过程的虚拟化使企业能够维护其半导体工艺的“数字孪生”。工艺中的变化可以很好地被理解;最大化器件性能,提高生产效率,同时最小化工程周期和周期时间。