将人工智能应用于FTCOTM
2024年7月25日
FTCO基于实际生产工艺中的物理和化学机制,利用人工智能(AI)和机器学习(ML)生成精确的TCAD数字模型(数字孪生)。对于这种数字孪生模型,可以采用DoE方法进行测试和分析,而无需真实流片,从而大大节省了制造相关的时间和费用。
这位作者还没有写个人简历。
我们为 Gigi Boss 对 386 篇日志做的贡献感到骄傲。
2024年7月25日
FTCO基于实际生产工艺中的物理和化学机制,利用人工智能(AI)和机器学习(ML)生成精确的TCAD数字模型(数字孪生)。对于这种数字孪生模型,可以采用DoE方法进行测试和分析,而无需真实流片,从而大大节省了制造相关的时间和费用。
June 20, 2024
June 12, 2024
It is often the case that a design of experiments (DOE) is required to optimize the performance of a particular device. Sometimes this simply means tweaking the implant dose for threshold voltage or other minor adjustments, but in other cases it can mean tweaking such things as high energy deep well implants.
Recently a new diffusion model was introduced to Victory Process: the CMOS model. This model aims at taking on the challenges brought by the specificities of CMOS device processing such as steep temperature ramps, short annealings or shallow implantations.
May 8, 2024
April 30, 2024
April 16, 2024
Properly setting the wafer orientation in Victory Process (VP) is critical for various processes such as ion implantation, etching, and deposition. For ion implantation in particular, the determination of the wafer orientation becomes crucial, given its profound impact on profile variations in channeling and non-channeling directions.
Photonic integrated circuits (PICs) are a key enabling technology for a broad range of current and next-generation products. Combining semiconductor materials and manufacturing processes common to microelectronics with the encoding, transmission and detection of light, PICs are transforming communication in datacenters by bringing bandwidth closer to compute cores, and are accelerating emerging applications like LiDAR for autonomy and quantum computing for the future of information processing.
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